The RF Matching Network



The RF Matching Network

Circuit Diagram of a RF matching network designed to convert the complex impedance of a plasma at 13.56 MHz to a 50-Ohm resistive load for the generator. The following is a list of circuit components.
 
 
 

 Introduction
The Ion Implanter
The Vacuum system 
The Ion Source 
The Ion Beam
 Glossary
The Faraday 
Matching Network
The Magnet 
Boron Trifluoride
Charge Neutralization
 References
 
 
 
 

RF Generator

G1 13.56MHz RF Generator delivers up to 3000 Watts into a 50-W , non-reactive load. It uses a 3 phase, 208 Vac, 50/60 Hz power source, is water-cooled, and provides control signals through a 25-pin analog/digital user port.

 
 

Variable Vacuum Capacitors

C1, C2 Variable Vacuum Capacitors have a range of from 7 to 1000 picofarads, and a working voltage of 5 kilovolts.

 
 

primary windings

T1 In the above circuit diagram, primary windings are show in black and secondary windings are red. The actual turn ratio may depend on several factors, coil length, capacitor values, source pressure range, ect.

 
 

RF Coil

L1 The water cooled (RF) coil, or antenna, couples the FM-band RF (13.56MHz) into a plasma contained within the ion source. It is supported by the base and has a metallic segment mounted directly within the gas confinement chamber to deliver ionizing energy into the gas ionization zone. United States Patent 5,661,308

 
 

Plasma A fourth state of matter -- not a solid, liquid or gas. In a plasma, the electrons are pulled free from the atoms and can move independently. The individual atoms are charged, even though the total number of positive and negative charges is equal, maintaining an overall electrical neutrality.

 
 

 
 

 Introduction
The Ion Implanter
The Vacuum system 
The Ion Source 
The Ion Beam
 Glossary
The Faraday 
Matching Network
The Magnet 
Boron Trifluoride
Charge Neutralization
 References
 

 

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This page is sponsored by Case Technology Inc.  since 5/1/98.

Updated 6/6/99.