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Multicusp Ion Sources - An ion source is a plasma generator from which beams of ions can be extracted. One type of ion source used in many applications is the multicusp ion source, named this way for the arrangement of the magnets that form magnetic cusp fields to contain the plasma
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Ion Sources
and Electron Guns This link will attempt to shed some light on the
principles and operation of basic lepton and hadron sources commonly used
in accelerators.
CERN Hadron Ion Sources For the production of hadronic particles for the CERN accelerator complex.
Cern Laser Ion Source- Extraction of a ~90 mA (all charge states) beam, with at least 5 mA of Pb 18+.
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| Colutron Research Corporation has two small Ion Gun systems to offer. Each Gun includes an ion source assembly, heat sink, acceleration and focusing system, vertical deflection plates, a 6" long velocity filter and a velocity filter guard ring control unit. |  |
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PHYSICON Corporation - Your source for ions: Standard sources, ray-traced beamlines, turn-key systems and upgrade assemblies for ion beams available for low eV ranges to 5, 10, 25, 50, and 100kV with spot sizes from microns to inches. | |
| ]The ISIS3000 ion source produces a high current, variable energy ion beam for the cleaning of sample surfaces in UHV. |  |
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Ion sources from National Electrostatics Corp. are used to produce a full range of positive and negative ion beam species. A tutorial on the basic operation of two ion sources is available. |
| Peabody Scientific - provides ion beam equipment to the research community for use in atomic and nuclear physics, materials modification, materials analysis, SIMS, etc. | 
 
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El-Mul is developing MWCNT high brightness electron sources coupled to ultra fast detectors for the Next Generation Lithography and Metrology (NGL / NGM) tools. |
| An Electron
Cyclotron Resonance Ion Source ECRIS
is based on a plasma, which is held in an open magnetic trap. A microwave with a
frequency which is equal to the gyration frequency of the electrons around
the magnetic field lines is injected, heating resonantly these electrons |
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Oxford
Applied Research is a supplier of UHV and
HV components and systems for the deposition and characterization
of thin films. |
| Veeco supplies the widest range of ion sources for the broadest variety of applications. Our sources range in size from 3cm to 5m, and offer anode layer, gridded, and gridless configurations. |
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SPECS
Your competent partner in Surface Science and Nanotechnology
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The IQP 10/63 |
Cold-Cathode
Penning Ion Source - The IQP 10/63 is a Penning discharge type ion
source mounted on a 4.5" (NW63CF) mounting flange with an easily
removable permanent magnet. The source can be supplied with a complete gas
inlet system.
Ion
Source IQE 11/35 - The IQE 11/35 is a very stable extractor type ion
source operating with a long-lifetime special Yttriumoxide coated Iridium
filament. Ion Source IQE 12/38 - The ion source IQE 12/38 is an extractor type, differentially pumped ion source producing a focused, scanable ion beam of high current density. |
| SemEquip, Inc. is a
technology leader in the development of ion implantation systems and
advanced ion source materials for the manufacture of logic and memory
chips. |
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The tectra PLASMA ION SOURCE is a multi-purpose source which can easily be user configured to produce either atoms or ions and finds uses in a wide range of HV and UHV applications. |
| FEI BEAM TECHNOLOGY - two-lens column (2LE) utilizes Schottky emission, proprietary electrostatic focusing optics, and stacked-disk column construction to provide high-resolution imaging capability and maximum current density. |
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SIMS Primary Ion Sources The duoplasmatron can operate with virtually any gas, but oxygen is the most common because oxygen implantation into the sample surface enhances ionization efficiency for electropositive elements. |
| Ionoptika - Dedicated to providing high-performance, high-quality, ion beam systems. |  |
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Inductively Coupled RF Plasma Source is designed to generate a continuous dense gas plasma for thin film deposition, etching, and material surface modification applications. |
| Development
of ECR Ion Sources
by: Roland Trassl Institut für Atom- und Molekülphysik
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Brookhaven Technology Group, Inc. The high brightness DC Surface Plasma Heavy Negative Ion Source (DC-SPHNIS) employs a hollow cathode discharge in a crossed ExB field for efficient plasma generation. The heavy negative ion beam is formed by the interaction of the plasma with the surface of a spherical focusing emitter. |
| The constricted plasma source utilizes a special form of a dc glow discharge, the constricted glow discharge. It is characterized by the presence of a small orifice (or constriction) placed in the discharge path between cathode and anode. - Ernest Orlando Lawrence Berkeley National Laboratory |  |
| Kimball Physics Inc. ion guns (ion
sources) with their matching power supplies are complete subsystems ready
to attach to a user-supplied vacuum chamber.
Model IGL-2101, 1 keV Ion Gun with electron-impact gas ionization, differential pumping, adjustable feedthrough, focus and deflection, mounted on a 23/4CF flange |
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| These pictures of the original White source were taken in 1985. The source was an adaptation of the Eaton Nova Freeman source, based on the Bernas source. |
More Ion Sources
Reference Shelf for Particle-Solid Interactions - This site contains information useful for researchers in the field of interactions of ions, electrons, and energetic photons with solids. Maintained by Raúl Baragiola, University of Virginia
Development of Electron Cyclotron Resonance (ECR) Ion Sources - Our Atomic Collisions Group has more than 20 years experience on a variety of atomic collision processes.
The Source Characterization and Measurement (SCAM) facility is a dedicated testbed for testing and evaluating hot filament ion source fabrication techniques and operating procedures.
The Electron Cyclotron Resonance (ECR) 14.5 GHz ATOMKI-ECRIS Ion Source. Maintained by dr. Sandor Biri at the Hungarian Academy of Sciences Institute of Nuclear Research.
IS1000 ION SOURCE is a broad beam source which operates at moderate energy levels (60-300 eV) and at high beam current (up to 4A). It has a uniform beam angle of approximately 60 degrees.
(Cryebis) Cryogenic Electron Beam Ion Source and (ECR) Electron Cyclotron Resonance Source
Ion Gun Design and Construction - This site is dedicated to a global discussion of fusion energy
Here's my collection of random links regarding fusion, IEC and other related stuff
Positive Ion SourceHigh current (10-AMP) plasma source
ECRIS - Electron Cyclotron Resonance Ion Source
The Faraday Cup Award Hall Of Fame - What is a Faraday Cup?
.The Laboratory for Ion Beam Research and Applications -The work of the laboratory is centered on the generation of ion beams and their application to microfabrication.
Plasma Engineering
Research Lab at Colorado State Univeristy Research is focused on broad
beam ion sources and their components for both space-based and terrestrial
applications as well as the performance of surfaces treated using the terrestrial
sources.
Central
Institute for Ion beams and Radionuclids - Three particle accelerators allow
us modern ionbeam methodes and analysis as well as techniques like
photo-electron-spectroscopy or electrical probe characterization.
Ion Beam Laboratory -We study the interaction of energetic ions with solid to understand the mechanisms leading to electronic excitations and how these excitations evolve and lead to the emission of light (luminescence), electrons, radiation, atoms and molecules (sputtering), and to radiation damage, chemical changes or heat.
The National Superconducting Cyclotron Laboratory - Surface Process by Ion Beam System and Ion Cluster Beam Deposition System curtesy of Kookmin University.
Solid State Devices and Ion Beam Technology Research Group Three implanters cover the energy range 25 keV to 4 MeV for many ions, including the major dopants for silicon.
Comstock, Inc. - Time-of-Flight Mass Spectrometers
Virtual Library: Chemical Education Resources
Pattern Transfer
with Dry Etching Techniques
This page is sponsored by Case Technology Inc. since 9/9/97.
Updated and all links verified 11/30/2010
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