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Ion Source Technology
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Multicusp
Ion Sources - An ion source is a plasma generator from which beams of
ions can be extracted. One type of ion source used in many applications is
the multicusp ion source, named this way for the arrangement of the
magnets that form magnetic cusp fields to contain the plasma Multicusp
Ion Sources with external rf antenna. |
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Ion Sources
and Electron Guns This link will attempt to shed some light on the
principles and operation of basic lepton and hadron sources commonly used
in accelerators.
CERN Hadron
Ion Sources For the production of hadronic particles for the CERN
accelerator complex.
Cern
Laser Ion Source- Extraction of a ~90 mA (all charge states) beam,
with at least 5 mA of Pb 18+.
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| Colutron Research
Corporation has two small Ion Gun systems to offer. Each Gun includes
an ion source assembly, heat sink, acceleration and focusing system, vertical
deflection plates, a 6" long velocity filter and a velocity filter guard
ring control unit. |
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PHYSICON Corporation -
Your source for ions: Standard sources, ray-traced beamlines, turn-key systems
and upgrade assemblies for ion beams available for low eV ranges to 5, 10, 25,
50, and 100kV with spot sizes from microns to inches. |
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| ]The ISIS3000 ion source
produces a high current, variable energy ion beam for the cleaning of sample
surfaces in UHV. |
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Ion sources from National
Electrostatics Corp. are used to produce a full range of positive and negative
ion beam species. A tutorial
on the basic operation of two ion sources is available. |
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| Peabody Scientific
- provides ion beam equipment to the research
community for use in atomic and nuclear physics, materials modification,
materials analysis, SIMS, etc. |
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El-Mul is developing MWCNT high brightness
electron sources coupled to ultra fast detectors for the Next Generation
Lithography and Metrology (NGL / NGM) tools.
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An Electron
Cyclotron Resonance Ion Source ECRIS
is based on a plasma, which is held in an open magnetic trap. A microwave with a
frequency which is equal to the gyration frequency of the electrons around
the magnetic field lines is injected, heating resonantly these electrons
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Oxford
Applied Research is a supplier of UHV and
HV components and systems for the deposition and characterization
of thin films.
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| Veeco supplies the
widest range of ion sources for the broadest variety of applications. Our
sources range in size from 3cm to 5m, and offer anode layer, gridded, and
gridless configurations. |

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SPECS
Your competent partner in Surface Science and Nanotechnology
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The IQP 10/63
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Cold-Cathode
Penning Ion Source - The IQP 10/63 is a Penning discharge type ion
source mounted on a 4.5" (NW63CF) mounting flange with an easily
removable permanent magnet. The source can be supplied with a complete gas
inlet system.
Ion
Source IQE 11/35 - The IQE 11/35 is a very stable extractor type ion
source operating with a long-lifetime special Yttriumoxide coated Iridium
filament.
Ion
Source IQE 12/38 - The ion source IQE 12/38 is an extractor type,
differentially pumped ion source producing a focused, scanable ion beam of
high current density.
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SemEquip, Inc. is a
technology leader in the development of ion implantation systems and
advanced ion source materials for the manufacture of logic and memory
chips.
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The tectra PLASMA ION SOURCE is a
multi-purpose source which can easily be user configured to produce either
atoms or ions and finds uses in a wide range of HV and UHV applications. |
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FEI BEAM TECHNOLOGY - two-lens column
(2LE) utilizes Schottky emission, proprietary electrostatic focusing
optics, and stacked-disk column construction to provide high-resolution
imaging capability and maximum current density. |

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SIMS Primary Ion
Sources The duoplasmatron can operate with virtually any gas, but oxygen
is the most common because oxygen implantation into the sample surface
enhances ionization efficiency for electropositive elements. |
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| Ionoptika - Dedicated to providing
high-performance, high-quality, ion beam systems. |
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KJLC
Filamentless Ion Source
- 3cm, 5cm, and 10cm Configurations
- Filamentless Sources
- Reactive Gas Compatible
- Internal or Flange Mount
- Collimated or Focused Grids
- UHV Compatible
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Brookhaven Technology Group, Inc.
The high brightness DC Surface Plasma Heavy Negative Ion Source (DC-SPHNIS)
employs a hollow cathode discharge in a crossed ExB field
for efficient plasma generation. The heavy negative ion beam is formed by
the interaction of the plasma with the surface of a spherical focusing
emitter. |
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constricted plasma source utilizes a special form of a dc glow
discharge, the constricted glow discharge. It is characterized by the
presence of a small orifice (or constriction) placed in the discharge path
between cathode and anode. - Ernest Orlando Lawrence Berkeley National
Laboratory |
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| Kimball Physics Inc. ion guns (ion
sources) with their matching power supplies are complete subsystems ready
to attach to a user-supplied vacuum chamber.
Model IGL-2101, 1 keV
Ion Gun with electron-impact
gas ionization, differential pumping, adjustable feedthrough, focus
and deflection, mounted on a 23/4CF
flange |
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More Ion Sources
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Ion Source
for the Low Energy Beam Line - Ions in the low energy beam line are
accelerated typically by a voltage of 10 kV.
Reference Shelf for
Particle-Solid Interactions - This site contains information useful for
researchers in the field of interactions of ions, electrons, and energetic
photons with solids. Maintained by Raúl Baragiola, University of Virginia
Development of Electron
Cyclotron Resonance (ECR) Ion Sources - Our Atomic Collisions Group
has more than 20 years experience on a variety of atomic collision processes.
The Source Characterization
and Measurement (SCAM) facility is a dedicated testbed for testing
and evaluating hot filament ion source fabrication techniques and operating
procedures.
The Electron Cyclotron Resonance
(ECR) 14.5 GHz ATOMKI-ECRIS Ion Source. Maintained by dr. Sandor Biri
at the Hungarian Academy of Sciences Institute of Nuclear Research.
IS1000 ION SOURCE is a broad beam
source which operates at moderate energy levels (60-300 eV) and at high
beam current (up to 4A). It has a uniform beam angle of approximately 60
degrees.
(Cryebis) Cryogenic
Electron Beam Ion Source and (ECR)
Electron Cyclotron Resonance Source
Ion
Gun Design and Construction - This site is dedicated to a global discussion
of fusion energy
Here's my collection
of random links regarding fusion, IEC and other related stuff
Ion sources at KVI
On-line
Ion Sources
Positive
Ion Source
ORNL ECR SOUCE
High
current (10-AMP) plasma source
Electron
Cyclotron Resonance Ion Sources
Anatech
Ion Source systems
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Ion Beam Links
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The
Faraday Cup Award Hall Of Fame - What
is a Faraday Cup?
.The Laboratory for Ion Beam
Research and Applications -The work of the laboratory is centered on
the generation of ion beams and their application to microfabrication.
Plasma Engineering
Research Lab at Colorado State Univeristy Research is focused on broad
beam ion sources and their components for both space-based and terrestrial
applications as well as the performance of surfaces treated using the terrestrial
sources.
Central
Institute for Ion beams and Radionuclids - Three particle accelerators allow
us modern ionbeam methodes and analysis as well as techniques like
photo-electron-spectroscopy or electrical probe characterization.
Ion Beam Analysis
(IBA) is based on the interaction, at both the atomic and the nuclear level,
between accelerated charged particles and the bombarded material. With
Links to others
IBA servers.
Ion Beam Laboratory
-We study the interaction of energetic ions with solid to understand the
mechanisms leading to electronic excitations and how these excitations
evolve and lead to the emission of light (luminescence), electrons, radiation,
atoms and molecules (sputtering), and to radiation damage, chemical changes
or heat.
The National
Superconducting Cyclotron Laboratory - Surface Process by Ion Beam System and Ion Cluster Beam Deposition System
curtesy of Kookmin University.
Solid
State Devices and Ion Beam Technology Research Group Three implanters
cover the energy range 25 keV to 4 MeV for many ions, including the major
dopants for silicon.
Comstock, Inc. -
Time-of-Flight Mass Spectrometers
ION BEAM
ANALYSIS (IBA) Italian Server
Rf Focused Drift tube (RFD)
Linac Structure
spectroscopynow.com
- Education Tutorials
GSI - Plasma and Beam Physics
Virtual Library:
Chemical Education Resources
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email
This page is sponsored by Case
Technology Inc. since 9/9/97.
Updated and all links verified 9/14/2005
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